Tech Advisory Board


Tres-Ark would like to welcome & publicly announce the newly created Technical Advisory Board members. Some have been active within the Tres-Ark organization for many years, while others are newly added; together, this exclusive board holds multiple decades of experience within the semiconductor “wets” industry. With unique talents & perspectives their talents piece together to account for a complete advisory team. Future plans for Tres-Ark include completing the Technical Advisory Board by adding two more members. Please take the time to get acquainted with Tres-Ark’s Technical Advisory Board.

  1. Dr. Thomas F. Edgar, Ph.D. Chemical Engineering

    Dr. Thomas Edgar

    Dr. Edgar is the George T. and Gladys H. Abell Chair in Engineering in the University of Texas' Chemical Engineering Department at The University of Texas at Austin. Dr. Edgar received his B.S. in chemical engineering from the University of Kansas and a Ph.D. from Princeton University. He has concentrated his academic work on process modeling, control and optimization, with several hundreds of articles in publication and the author of many chemical process books. With many decades of process control experience, Dr. Edgar interfaces with Tres-Ark engineering bi-monthly as an expert in the our process control theory; he educates our employees on the latest ideas within the chemical industry, as well as advises our chemical engineers on advanced process control.

    Accomplishments:

    1. AIChE: Colburn Award (1980), Director (1989-92)
    2. Computing in Chemical Engineering Award (1995), President (1997)
    3. ASEE: Meriam-Wiley Distinguished Author Award (1990)
    4. George Westinghouse Award (1988), Chemical Engineering Division Lecturer (1996)
    5. Chair, Council for Chemical Research (1992-93)
    6. President, American Automatic Control Council (AACC) (1990-91)
    7. AACC Education Award (1992)
    8. ISA Eckman Education Award (1993)
    9. ASEE Fellow (2005)
    10. IFAC Control Engineering Prize (2005)
    11. Warren K. Lewis Award in Chemical Engineering Education (AIChE) (2006)
    12. Process Automation Hall of Fame (Control Magazine) (2007)

  2. Dr. Klaus Wolke, Ph.D. Physics

    Dr. Klaus Wolke

    Dr. Wolke received his Ph.D. in Nuclear Physics at Munster University in 1988 after completing his Masters of Science at Westf. Wilhelms University in Munster, Germany. He joined the IBM Microelectronics Division at the DRAM manufacturing plant as a process engineer for dry-etch processes. From 1993 he was section manager for wet processing. In 1995 he became Manager of the Process Application and Development Division at STEAG, a global equipment supplier, MicroTech, focusing on the development of critical cleaning processes for the semiconductor industry. Dr. Wolke has worked with Tres-Ark for 4 years as a market consultant and a process control expert. In 2007, Dr. Wolke prepared and presented a poster presentation titled “Feed-Forward Control for Advanced Chemical Blending” for the Surface Preparation and Cleaning Conference hosted by Sematech in Austin, TX.

    Selected Publications while working with Tres-Ark:

    1. 2007 Sematech Surface Preparation and Cleaning Conference Presenter

  1. Dr. Lois Weyer, Ph.D. Analytical Chemist

    Dr. Lois Weyer

    Dr. Lois Weyer has been employed in the chemical industry for about 32 years, working primarily in spectroscopy and process analysis, specializing in optical spectroscopy. After working for several years in traditional near IR, UV and mid IR, she began developing industrial applications for the “new” NIR in 1983. This resulted in installations in at least 20 Hercules plants all over the globe. This then led to the initiation of a process analytical effort at her company, and resulted in installations of IR, near IR, Raman, UV, and other systems at a number of US and international plants. She earned an MS degree in physical chemistry in 1971 and a Ph.D. in 1996, studying chemometrics under Steven Brown at the University of Delaware. She has taught short courses in near IR spectroscopy and PAT, chairs an ACS sub-group on process spectroscopy, led the Chambersburg IDRC in 1998, and has presented many talks and chaired sessions at EAS, FACSS, and other conferences. Lois has worked closely with Tres-Ark for 5 years as an analytical chemist with a practical, problem-solving, multi-tasking approach.

    2. Accomplishments:

    1. EAS award for achievements in NIR in 1992
    2. Delaware Valley Spectroscopist of the Year Award in 1999
    3. American Chemical Society, Chair of Delaware Section in 2001
    4. Has served on many industry panels and presented at a number of conferences.

    Selected Publications while working with Tres-Ark:

    1. “Practical Guide to Interpretive Near-Infrared Spectroscopy” J. Workman, Jr. and L. Weyer, CRC Press, Taylor & Francis Group, to be published November, 2007.
    2. “Installation of a multiplexed Raman system in a chemical process,” L. G. Weyer, D. Yee, G. I. Pearson, and J. Wade, Appl. Spec., 58(12), 1500-1505 (2004).