home page picture wafer processing link
  • Tres-Ark's highly progressive ability to control, analyze and produce specific chemical mixtures & blends, is the key to your company's advancement.
  • Achieve Angstrom-level etch control with our precise blending technology.
TreLytics

Tres-Ark announces the launch of an analytical product line.

Spectral & Conductance Monitors
  1. Tres-Ark Announces Partnerships with Two Premier Companies

    In California, Engineered Solutions (www.engrsolutions.com) will represent Tres-Ark as their sales representative. Combining the innovative and technologically advanced product lines of Tres-Ark with the exceptional contract manufacturing, engineering and mechanical capabilities of Engineered Solutions will result in a full system solution from patented concept, to engineering, to manufacturing and world class supply chain management.

    In the North West, Tres-Ark is pleased to announce our partnership with Beltec Sales (www.beltecsales.com). Beltec will represent Tres-Ark products in OR, WA, ID, MT and UT. Founded in 1988, Beltec prides itself on customer service, including on time deliveries, prompt follow up and complete customer satisfaction.

  2. EuroAsia IC Industry Awards 2008 Shortlist Announced

    This year the committee had in excess of 135 nominations from vendors, manufacturers, and users. These awards are unique to this industry as they serve as a platform for recognition. The users determine who will win!

    Tres-Ark’s AutoLytics automated, inline CMP slurry monitoring system was nominated in the category of “Sub System/Component Provider – New System Award”. Your vote at www.euroasiasemiconductor.com for Tres-Ark’s AutoLytics system could secure this prestigious award for us. Your vote is much appreciated!


Coming Events:

AEC/APC – Advanced Engineering Control & Advance Process Control Symposium October 4 – 8, 2008, Salt Lake City, UT


Past Events:

2 method patents allowed. PAT US 7,363,114 B2 "Batch Mixing Method with Standard Deviation Homogeneity Monitoring" PAT US 11/484,020 "Batch Mixing Method with First Derivative Homogeneity Monitoring"

2 more Patents allowed for FractalFill™
Blending products. US 7,363,115 B2
"Point-of-Use mixing method with First Derivative Homogeneity Monitoring." US PAT No. 11/177,930 "Chemical Mixing Apparatus, System and Method."

Apparatus patent approved for FractalFill™
Blending products. PAT US 7,198, 753 B1
April 13, 2007 & PAT US 7,281,840
Oct. 16, 2007


Tres-Ark's Philosophy

"We strive to be face vulnerable by acting as an employee of each organization we work with in order to complete each project successfully."